Substrate Processing Apparatus



A supply flow passage branches into a plurality of upstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis of a substrate. A return flow passage is connected to the upstream flow passage. A downstream heater heats liquid flowing through the upstream flow passage. A downstream switching unit supplies the liquid, supplied to the plurality of upstream flow passages from the supply flow passage, to one of the plurality of discharge ports and the return flow passage, selectively.




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Patent Citations (3)

    Publication numberPublication dateAssigneeTitle
    CN-105895560-AAugust 24, 2016株式会社思可林集团基板处理装置
    JP-H11165114-AJune 22, 1999Dainippon Screen Mfg Co Ltd, 大日本スクリーン製造株式会社Single substrate processing device
    US-2013014787-A1January 17, 2013Shingo Urata, Taki Akihiko, Hiroki Tsujikawa, Eri Fujita, Fujitani YoshiyukiSubstrate processing apparatus and substrate processing method

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