Substrate Processing Apparatus

基板处理装置

Abstract

本发明提供一种基板处理装置,该基板处理装置包括将基板保持为水平并使基板围绕通过基板的中央部的铅垂的旋转轴线旋转的基板保持单元和向由所述基板保持单元保持的基板供给处理液的处理液供给系统。供给流路分支成多个上游流路。多个喷出口分别配置在距旋转轴线的距离不同的多个位置。返回流路与上游流路连接。下游加热器对在上游流路内流动的液体进行加热。下游切换单元能够将从供给流路供给到多个上游流路的液体有选择地供给到多个喷出口以及返回流路中的一方。
A supply flow passage branches into a plurality of upstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis of a substrate. A return flow passage is connected to the upstream flow passage. A downstream heater heats liquid flowing through the upstream flow passage. A downstream switching unit supplies the liquid, supplied to the plurality of upstream flow passages from the supply flow passage, to one of the plurality of discharge ports and the return flow passage, selectively.

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Patent Citations (3)

    Publication numberPublication dateAssigneeTitle
    CN-105895560-AAugust 24, 2016株式会社思可林集团基板处理装置
    JP-H11165114-AJune 22, 1999Dainippon Screen Mfg Co Ltd, 大日本スクリーン製造株式会社Single substrate processing device
    US-2013014787-A1January 17, 2013Shingo Urata, Taki Akihiko, Hiroki Tsujikawa, Eri Fujita, Fujitani YoshiyukiSubstrate processing apparatus and substrate processing method

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